DocumentCode :
3398826
Title :
Physically based description of quasi-saturation region of vertical DMOS power transistors
Author :
Kreuzer, C.H. ; Krischke, N. ; Nance, P.
Author_Institution :
Bundeswehr Univ., Munich, Germany
fYear :
1996
fDate :
8-11 Dec. 1996
Firstpage :
489
Lastpage :
492
Abstract :
For short circuit design protection, quasi-saturation behaviour of vertical power DMOS transistors has to be included in circuit simulator compact models. In this region an unexpected increase in current has been observed, due to the injection of electrons from the n/sup +/ source region into the n-substrate. The purpose of this paper is to analyze this effect and include its results in a compact model for circuit simulation.
Keywords :
circuit analysis computing; electric resistance; electron density; power MOSFET; semiconductor device models; voltage distribution; circuit simulation; circuit simulator compact models; drain resistance; electron concentration; electron injection; n-substrate; n/sup +/ source region; physically based description; quasi-saturation region; short circuit design protection; vertical DMOS power transistors; voltage distribution; Analytical models; Circuit simulation; Contact resistance; Doping; Electric resistance; Electron mobility; Immune system; Medical simulation; Power transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-3393-4
Type :
conf
DOI :
10.1109/IEDM.1996.553844
Filename :
553844
Link To Document :
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