Title :
Representation and Inhibition of Abnormal Arcing in Plasma Vapor Deposition Filming
Author :
Linggang Kong ; Qing´an Jiang ; Weizhong Zhang
Author_Institution :
Lanzhou Jiaotong Univ., Lanzhou
fDate :
July 29 2007-Aug. 11 2007
Abstract :
This paper introduces representations of abnormal arcing based on equivalent impedance derived function and further proposes an inhibition design grounded on impedance change rate diagnosis in filming process of plasma vapor deposition.
Keywords :
arcs (electric); electric impedance; plasma deposition; vapour deposition; equivalent impedance derived function; filming process; impedance change rate diagnosis; inhibition design; plasma vapor deposition; Chemical vapor deposition; Impedance; Plasma density; Plasma diagnostics; Plasma displays; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma temperature; Voltage;
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
DOI :
10.1109/INOW.2007.4302982
