• DocumentCode
    3399845
  • Title

    The operating curve: a method to measure and benchmark manufacturing line productivity

  • Author

    Aurand, Steven S. ; Miller, Peter J.

  • Author_Institution
    IBM Consulting Group, Charlotte, NC, USA
  • fYear
    1997
  • fDate
    10-12 Sep 1997
  • Firstpage
    391
  • Lastpage
    397
  • Abstract
    Every factory needs to benchmark and track its productivity level over time to remain competitive in today´s marketplace. Two fundamental indicators of factory productivity are product cycle time and asset utilization, which are mathematically related to one another. The IBM Consulting Group has developed a methodology called the Operating Curve that uses these two indicators to benchmark and predict a manufacturing line´s performance. With this methodology, a line´s performance over any time period is measured using two parameters: the line´s overall cycle time performance and the line´s overall throughput performance. Each parameter is then measured against the line´s theoretical best possible performance for each metric, resulting in the line´s Operating Point for the time period. These two parameters are also used to compute the line´s Performance Index for the time period, a measure of the line´s overall level of maturity. When applying this methodology, a line´s actual performance is measured using historical data, and required future performance is estimated using data from the company´s business or strategic plan. The Operating Curve methodology has been successfully applied in five of IBM´s semiconductor fabricators
  • Keywords
    human resource management; performance index; semiconductor device manufacture; IBM semiconductor fab; asset utilization; benchmark; business plan; manufacturing line productivity; measurement; metric; operating curve; operating point; performance index; product cycle time; throughput; Engineering management; Manufacturing; Microelectronics; Performance analysis; Production facilities; Productivity; Queueing analysis; Semiconductor device manufacture; Throughput; Time measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 1997. IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-4050-7
  • Type

    conf

  • DOI
    10.1109/ASMC.1997.630768
  • Filename
    630768