DocumentCode
3399885
Title
Fabrication of Highly ordered pore arrays by soft nanoimprint lithography
Author
Shi, Yongsheng ; Liu, Hongzhong ; Ding, Yucheng ; Lu, Bingheng ; Fan, Duowang
Author_Institution
Xi´´an Jiaotong Univ., Xian
fYear
2007
fDate
July 29 2007-Aug. 11 2007
Firstpage
280
Lastpage
281
Abstract
A soft nano-imprint lithography (NIL) technology is approached to fabricate the pore arrays nanostructures. Experimental results reveal that the proposed process can fabricate highly ordered pore arrays with a low cost.
Keywords
electron beam lithography; nanolithography; nanoporous materials; soft lithography; electron-beam lithography; highly ordered pore array fabrication; pore arrays nanostructures; porous nanostructures; soft nanoimprint lithography; Costs; Dry etching; Electron beams; Fabrication; Microelectronics; Nanolithography; Nanostructures; Optical materials; Photonic crystals; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location
Beijing
Print_ISBN
978-1-4244-1591-5
Type
conf
DOI
10.1109/INOW.2007.4302991
Filename
4302991
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