Title :
Fabrication of Highly ordered pore arrays by soft nanoimprint lithography
Author :
Shi, Yongsheng ; Liu, Hongzhong ; Ding, Yucheng ; Lu, Bingheng ; Fan, Duowang
Author_Institution :
Xi´´an Jiaotong Univ., Xian
fDate :
July 29 2007-Aug. 11 2007
Abstract :
A soft nano-imprint lithography (NIL) technology is approached to fabricate the pore arrays nanostructures. Experimental results reveal that the proposed process can fabricate highly ordered pore arrays with a low cost.
Keywords :
electron beam lithography; nanolithography; nanoporous materials; soft lithography; electron-beam lithography; highly ordered pore array fabrication; pore arrays nanostructures; porous nanostructures; soft nanoimprint lithography; Costs; Dry etching; Electron beams; Fabrication; Microelectronics; Nanolithography; Nanostructures; Optical materials; Photonic crystals; Resists;
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
DOI :
10.1109/INOW.2007.4302991
