DocumentCode :
3399896
Title :
Investigation of ITO Thin Film Deposited On Organic Films by RF Magnetron Sputter
Author :
Sun, Shuo ; Zhang, Gui-Ling ; Zhang, Fu-Jia
Author_Institution :
Lanzhou Univ., Lanzhou
fYear :
2007
fDate :
July 29 2007-Aug. 11 2007
Firstpage :
282
Lastpage :
283
Abstract :
ITO thin film deposited on organic substrate by RF magnetron sputter in low temperture. The relationship between film´s surface morphology, resistivity, transmittance and substrate temperature, sputter power and film´s thickness were analyzinged.
Keywords :
atomic force microscopy; electrical resistivity; ellipsometry; indium compounds; optical films; sputter deposition; sputtered coatings; surface morphology; ultraviolet spectra; AFM; InSnO; RF magnetron sputter deposition; UV-spectrophotometer; ellipsometer; film resistivity; film surface morphology; film thickness; film transmittance; indium tin oxide thin film; organic substrate films; sputter power; substrate temperature; surface profilometry; Conductive films; Indium tin oxide; Optical films; Radio frequency; Sputtering; Substrates; Sun; Surface morphology; Temperature; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-1591-5
Type :
conf
DOI :
10.1109/INOW.2007.4302992
Filename :
4302992
Link To Document :
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