DocumentCode
3399896
Title
Investigation of ITO Thin Film Deposited On Organic Films by RF Magnetron Sputter
Author
Sun, Shuo ; Zhang, Gui-Ling ; Zhang, Fu-Jia
Author_Institution
Lanzhou Univ., Lanzhou
fYear
2007
fDate
July 29 2007-Aug. 11 2007
Firstpage
282
Lastpage
283
Abstract
ITO thin film deposited on organic substrate by RF magnetron sputter in low temperture. The relationship between film´s surface morphology, resistivity, transmittance and substrate temperature, sputter power and film´s thickness were analyzinged.
Keywords
atomic force microscopy; electrical resistivity; ellipsometry; indium compounds; optical films; sputter deposition; sputtered coatings; surface morphology; ultraviolet spectra; AFM; InSnO; RF magnetron sputter deposition; UV-spectrophotometer; ellipsometer; film resistivity; film surface morphology; film thickness; film transmittance; indium tin oxide thin film; organic substrate films; sputter power; substrate temperature; surface profilometry; Conductive films; Indium tin oxide; Optical films; Radio frequency; Sputtering; Substrates; Sun; Surface morphology; Temperature; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano-Optoelectronics Workshop, 2007. i-NOW '07. International
Conference_Location
Beijing
Print_ISBN
978-1-4244-1591-5
Type
conf
DOI
10.1109/INOW.2007.4302992
Filename
4302992
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