Title :
Development of manufacture technological processes of complex profil silicon structures for VHF-devices
Author :
Timoshenkov, P.S. ; Kalugin, V.V. ; Klochko, A.V. ; Kalugina, V.I. ; Prokop´ev, E.P.
Author_Institution :
Moscow Inst. of Electron. Technol., Tech. Univ., Moscow
Abstract :
Results of study and development of technological processes of deep anisotropic etching of micromechanical elements (MME) of microelectromechanical systems (MEMS) for VHF devices are submitted.
Keywords :
elemental semiconductors; etching; micromechanical devices; microwave devices; silicon; MEMS; Si; complex profil silicon structures; deep anisotropic etching; manufacture technological processes; microelectromechanical systems; micromechanical elements; vhf devices; Anisotropic magnetoresistance; Etching; IEEE catalog; Instruments; Manufacturing processes; Microwave technology; Organizing; Plasma applications; Silicon;
Conference_Titel :
Microwave & Telecommunication Technology, 2008. CriMiCo 2008. 2008 18th International Crimean Conference
Conference_Location :
Sevastopol, Crimea
Print_ISBN :
978-966-335-166-7
Electronic_ISBN :
978-966-335-169-8
DOI :
10.1109/CRMICO.2008.4676505
