• DocumentCode
    3401302
  • Title

    Development of manufacture technological processes of complex profil silicon structures for VHF-devices

  • Author

    Timoshenkov, P.S. ; Kalugin, V.V. ; Klochko, A.V. ; Kalugina, V.I. ; Prokop´ev, E.P.

  • Author_Institution
    Moscow Inst. of Electron. Technol., Tech. Univ., Moscow
  • fYear
    2008
  • fDate
    8-12 Sept. 2008
  • Firstpage
    565
  • Lastpage
    566
  • Abstract
    Results of study and development of technological processes of deep anisotropic etching of micromechanical elements (MME) of microelectromechanical systems (MEMS) for VHF devices are submitted.
  • Keywords
    elemental semiconductors; etching; micromechanical devices; microwave devices; silicon; MEMS; Si; complex profil silicon structures; deep anisotropic etching; manufacture technological processes; microelectromechanical systems; micromechanical elements; vhf devices; Anisotropic magnetoresistance; Etching; IEEE catalog; Instruments; Manufacturing processes; Microwave technology; Organizing; Plasma applications; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave & Telecommunication Technology, 2008. CriMiCo 2008. 2008 18th International Crimean Conference
  • Conference_Location
    Sevastopol, Crimea
  • Print_ISBN
    978-966-335-166-7
  • Electronic_ISBN
    978-966-335-169-8
  • Type

    conf

  • DOI
    10.1109/CRMICO.2008.4676505
  • Filename
    4676505
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3401302