Title :
System Requirement Analysis of Laser Interference Nanolithography
Author :
Wang, Zuobin ; Zhang, Jin ; Peng, Changsi ; Tan, Chunlei ; Ayerdi, Isabel ; Rodriguez, Ainara ; Verevkin, Yury K. ; Berthou, Thierry ; Tisserand, Stéphane ; Olaizola, Santiago M.
Author_Institution :
Cardiff Univ., Cardiff
Abstract :
This paper presents a system requirement analysis of multi-beam laser interference nanolithography for nanoscale structuring of materials including seven sections: introduction, formation of multi-beam laser interference patterns, user requirements, system architecture, experiments, discussions and conclusions. Analytical expressions were obtained for the spatial distribution of radiation of the interfering beams as a function of their amplitudes, phases, angles of incidence on the sample, and polarization planes with computer simulation and experimental results. The environmental effect and technological potential were also discussed.
Keywords :
light interferometry; nanolithography; nanopatterning; photolithography; amplitudes; interferometry; laser interference nano lithography; nano patterning; nanoscale structuring; polarization planes; spatial distribution; system requirement analysis; Etching; Interference; Ion beams; Laser beams; Lithography; Nanolithography; Optical materials; Probes; Resists; Writing; interferometry; laser interference nanolithography; nano patterning; nano structuring;
Conference_Titel :
Mechatronics and Automation, 2007. ICMA 2007. International Conference on
Conference_Location :
Harbin
Print_ISBN :
978-1-4244-0828-3
Electronic_ISBN :
978-1-4244-0828-3
DOI :
10.1109/ICMA.2007.4303582
