DocumentCode
3402164
Title
Substrate batch effect on GaAs MESFET characteristics under ultra-short pulses exposure
Author
Bobreshov, A.M. ; Korovchenko, I.S. ; Stepkin, V.A. ; Uskov, G.K.
Author_Institution
Voronezh State Univ., Voronezh
fYear
2008
fDate
8-12 Sept. 2008
Firstpage
672
Lastpage
673
Abstract
Experimental investigation of GaAs MESFET substrate batch effect on characteristics of ultra-short pulses exposure was carried out. This effect was developed and described.
Keywords
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; GaAs; MESFET; ultra-short pulses exposure; Chromium; Gallium arsenide; MESFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave & Telecommunication Technology, 2008. CriMiCo 2008. 2008 18th International Crimean Conference
Conference_Location
Sevastopol, Crimea
Print_ISBN
978-966-335-166-7
Electronic_ISBN
978-966-335-169-8
Type
conf
DOI
10.1109/CRMICO.2008.4676551
Filename
4676551
Link To Document