Microoptical applications of porous silicon superlattices

Author

Thanissen, M. ; Berger, M.G. ; Kruger, Max ; Billat, S. ; Loni, A. ; Arens-Fischer, R. ; Luth, H. ; Theib, W.

Author_Institution

Inst. fur Schicht- und Ionentech., Forschungszentrum Julich GmbH, Germany

fYear

1996

fDate

5-9 Aug. 1996

Firstpage

47

Lastpage

48

Abstract

Using reflectance measurements we have investigated the dependence of the refractive index of porous silicon layer structures on the formation current density for different substrates. Based on these results various kinds of optical interference filters were fabricated. We have formed samples consisting of discrete single layers with different porosities as well as samples with continuous variations of the refractive index (rugate filters). Using this technique the fabrication of anti-reflectance coatings with low reflectance over a wide range of wavenumbers becomes possible.

Keywords

antireflection coatings; elemental semiconductors; etching; interference filters; optical fabrication; optical films; optical filters; porous materials; reflectivity; refractive index; semiconductor superlattices; silicon; Si; antireflectance coating; current density; electrochemical etching; fabrication; microoptics; optical interference filter; porous silicon superlattice; reflectance; refractive index; rugate filter; Current density; Current measurement; Density measurement; Optical filters; Optical refraction; Optical superlattices; Optical variables control; Reflectivity; Refractive index; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Applications of Lasers in Materials Processing/Broadband Optical Networks/Smart Pixels/Optical MEMs and Their Applications. IEEE/LEOS 1996 Summer Topical Meetings:

Conference_Location

Keystone, CO, USA

Print_ISBN

0-7803-3175-3

Type

conf

DOI

10.1109/LEOSST.1996.540789

Filename

540789