Title :
Fabrication and analysis of Si/SiO2 micro-mechanical modulators
Author :
Patterson, J. ; Zeghbroeck, BVan
Author_Institution :
Dept. of Electr. & Comput. Eng., Colorado Univ., Boulder, CO, USA
Abstract :
We report on a new and inexpensive fabrication technique for micro-mechanical electrically tunable modulators. The modulators consist of thermally grown silicon dioxide (SiO/sub 2/) cantilever structures fabricated on a
Keywords :
electro-optical modulation; elemental semiconductors; etching; isolation technology; micromechanical resonators; optical fabrication; scanning electron microscopy; silicon; silicon compounds; SEM; Si; Si-SiO/sub 2/; Si/SiO/sub 2/ micro-mechanical modulators; dry etching; electrical isolation; electrically tunable modulators; fabrication technique; hysteretic behavior; resonant frequency; thermally grown SiO/sub 2/ cantilever structures; wet etching; Application software; Biomembranes; Computer displays; Electrostatic analysis; Optical device fabrication; Optical devices; Optical modulation; Silicon; Sputter etching; Voltage;
Conference_Titel :
Advanced Applications of Lasers in Materials Processing/Broadband Optical Networks/Smart Pixels/Optical MEMs and Their Applications. IEEE/LEOS 1996 Summer Topical Meetings:
Conference_Location :
Keystone, CO, USA
Print_ISBN :
0-7803-3175-3
DOI :
10.1109/LEOSST.1996.540796
