Title :
Research of the effects on collection efficiency of mirror thickness in EUV collector
Author :
Shuqing Zhang ; Dongyuan Zhu ; Runshun Li ; Qi Wang ; Baojun Zuo ; Qi Wang
Author_Institution :
Res. Center for Space Opt. Eng., Harbin Inst. of Technol., Harbin, China
Abstract :
This paper analyzes the mechanism of the mirror thickness´s effects on the collection efficiency of the collector in EUV Lithography. A calculation method of collection efficiency is presented with the mirror thickness taken into account. Meanwhile, the curve of collection efficiency with the mirror thickness as the argument is calculated based on our previous designed collector. The collected range of each mirror is calculated under a series of mirror thicknesses. The reason why some inner mirrors lose collected function is also analyzed when the mirror is too thick. The research is meaningful to the design and processing of the collector.
Keywords :
mirrors; optical design techniques; ultraviolet lithography; EUV collector; EUV lithography; collection efficiency; mirror thickness; Ellipsoids; Equations; Lithography; Mathematical model; Mirrors; Optical reflection; Ultraviolet sources; EUV Lithography; Wolter I collector; collection efficiency; integrating range; mirror thickness;
Conference_Titel :
Optoelectronics and Microelectronics Technology (AISOMT), 2011 Academic International Symposium on
Conference_Location :
Harbin
Print_ISBN :
978-1-4577-0794-0
DOI :
10.1109/AISMOT.2011.6159344
