Title :
Pinch dynamics of the 13.5 nm EUV-emitting plasma in a LA-DPP source
Author :
Zhu, Qiushi ; Yamada, Junzaburo ; Kishi, Nozomu ; Hosokai, Tomonao ; Watanabe, Masato ; Okino, Akitoshi ; Horioka, Kazuhiko ; Hotta, Eiki
Author_Institution :
Dept. of Energy Sci., Tokyo Inst. of Technol., Yokohama, Japan
Abstract :
Pinch dynamics of the imploding plasma and its relations with the 13.5 nm extreme ultraviolet (EUV) emissions have been experimentally investigated for a laser assisted Sn based discharge produced plasma (LA-DPP) EUV source. Plasma behaviors during the discharge are clarified using the laser aided shadowgraphic technique. Temporally and spatially resolved electron density distributions obtained by using Nomarski interferometry reveal that the maximum EUV emission corresponds to the electron density of (2.0-3.0)×1018 cm-3. The ion fraction and electron temperature of the pre-pinch plasma are estimated using a stationary collisional-radiative model.
Keywords :
discharges (electric); electron density; light interferometry; pinch effect; plasma collision processes; plasma density; plasma diagnostics; plasma temperature; ultraviolet lithography; EUV source; EUV-emitting plasma; Nomarski interferometry; electron density; electron temperature; extreme ultraviolet emissions; imploding plasma; ion fraction; laser aided shadowgraphic technique; laser assisted Sn based discharge produced plasma; pinch dynamics; pre-pinch plasma; spatially resolved electron density distributions; stationary collisional-radiative model; wavelength 13.5 nm; Anodes; Discharges; Fault location; Plasmas; Tin; Ultraviolet sources; 13.5 nm EUV source; LA-DPP; Z-pinch; interferometry; plasma diagnostics;
Conference_Titel :
Optoelectronics and Microelectronics Technology (AISOMT), 2011 Academic International Symposium on
Conference_Location :
Harbin
Print_ISBN :
978-1-4577-0794-0
DOI :
10.1109/AISMOT.2011.6159346
