DocumentCode :
3406886
Title :
Effects of substrate ion bombardment on characteristics of vacuum-arc plasma deposited hard coatings
Author :
Braic, V. ; Pavelescu, D. ; Balaceanu, M. ; Zoita, C.N. ; Braic, M. ; Kiss, A. ; Vladescu, A.
Author_Institution :
Nat. Inst. for Optoelectron., Bucharest
Volume :
2
fYear :
2008
fDate :
15-19 Sept. 2008
Firstpage :
503
Lastpage :
506
Abstract :
This work aims to investigate the influence of the energy and flux of the ions striking the substrate on the characteristics of the ZrCN coatings deposited by cathodic arc method. The coatings were investigated for elemental and phase composition, chemical binding state, texture, residual stress, hardness, adhesion and tribological behavior using GDOS, Raman spectroscopy and XRD techniques, surface profilometry, hardness and scratch adhesion measurements, and tribological tests. Various substrate current densities (in the range 2-7 mA/cm2) were obtained by using 1 or 2 cathodes, while different ion energies resulted from the variation of the substrate negative bias voltage (in the range 50-200 V). Chemical bonds, texture, mechanical and tribological characteristics of the films were observed to strongly depend on the ion bombardment conditions. The dominant factor in achieving high hardness values (in excess of 40 GPa) and superior wear resistance was found to be the substrate current density.
Keywords :
Raman spectra; X-ray diffraction; adhesion; current density; hardness; internal stresses; ion beam effects; plasma deposited coatings; texture; thin films; tribology; wear resistance; zirconium compounds; GDOS; Raman spectroscopy; XRD; ZrCN; adhesion; cathodic arc method; chemical binding state; current densities; elemental composition; films; hardness; phase composition; residual stress; scratch adhesion measurements; substrate ion bombardment; substrate negative bias voltage; surface profilometry; texture; tribology; vacuum-arc plasma deposited hard coatings; wear resistance; Adhesives; Chemical elements; Coatings; Current density; Plasma chemistry; Plasma properties; Raman scattering; Residual stresses; Spectroscopy; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2008. ISDEIV 2008. 23rd International Symposium on
Conference_Location :
Bucharest
ISSN :
1093-2941
Print_ISBN :
978-973-755-382-9
Electronic_ISBN :
1093-2941
Type :
conf
DOI :
10.1109/DEIV.2008.4676840
Filename :
4676840
Link To Document :
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