• DocumentCode
    3406886
  • Title

    Effects of substrate ion bombardment on characteristics of vacuum-arc plasma deposited hard coatings

  • Author

    Braic, V. ; Pavelescu, D. ; Balaceanu, M. ; Zoita, C.N. ; Braic, M. ; Kiss, A. ; Vladescu, A.

  • Author_Institution
    Nat. Inst. for Optoelectron., Bucharest
  • Volume
    2
  • fYear
    2008
  • fDate
    15-19 Sept. 2008
  • Firstpage
    503
  • Lastpage
    506
  • Abstract
    This work aims to investigate the influence of the energy and flux of the ions striking the substrate on the characteristics of the ZrCN coatings deposited by cathodic arc method. The coatings were investigated for elemental and phase composition, chemical binding state, texture, residual stress, hardness, adhesion and tribological behavior using GDOS, Raman spectroscopy and XRD techniques, surface profilometry, hardness and scratch adhesion measurements, and tribological tests. Various substrate current densities (in the range 2-7 mA/cm2) were obtained by using 1 or 2 cathodes, while different ion energies resulted from the variation of the substrate negative bias voltage (in the range 50-200 V). Chemical bonds, texture, mechanical and tribological characteristics of the films were observed to strongly depend on the ion bombardment conditions. The dominant factor in achieving high hardness values (in excess of 40 GPa) and superior wear resistance was found to be the substrate current density.
  • Keywords
    Raman spectra; X-ray diffraction; adhesion; current density; hardness; internal stresses; ion beam effects; plasma deposited coatings; texture; thin films; tribology; wear resistance; zirconium compounds; GDOS; Raman spectroscopy; XRD; ZrCN; adhesion; cathodic arc method; chemical binding state; current densities; elemental composition; films; hardness; phase composition; residual stress; scratch adhesion measurements; substrate ion bombardment; substrate negative bias voltage; surface profilometry; texture; tribology; vacuum-arc plasma deposited hard coatings; wear resistance; Adhesives; Chemical elements; Coatings; Current density; Plasma chemistry; Plasma properties; Raman scattering; Residual stresses; Spectroscopy; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2008. ISDEIV 2008. 23rd International Symposium on
  • Conference_Location
    Bucharest
  • ISSN
    1093-2941
  • Print_ISBN
    978-973-755-382-9
  • Electronic_ISBN
    1093-2941
  • Type

    conf

  • DOI
    10.1109/DEIV.2008.4676840
  • Filename
    4676840