Title :
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144)
Abstract :
The following topics were discussed: trends in devices and processing; advanced implantation systems; process control; ion-solid interactions; materials science aspects; emerging technologies and applications
Keywords :
doping profiles; impurity distribution; ion implantation; particle beam diagnostics; semiconductor device manufacture; semiconductor doping; advanced implantation systems; ion implantation; ion-solid interactions; process control;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto, Japan
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1999.812036
