DocumentCode
3408600
Title
The core ion implanter for 300-mm wafers: IW-630
Author
Nishihashi, T. ; Yokoo, H. ; Hisamune, T. ; Sakuishi, T. ; Kimura, N. ; Niikura, K. ; Ishiwatari, S. ; Fukui, R. ; Tomita, M. ; Shimizu, T. ; Miyaya, T. ; Iwase, Y. ; Kunibe, T. ; Ogata, S. ; Fuwa, K. ; Kashimoto, K. ; Fujiyama, J. ; Sakurada, Y.
Author_Institution
ULVAC Japan Ltd., Kanagawa, Japan
Volume
1
fYear
1999
fDate
1999
Firstpage
150
Abstract
The IW-630 is the core machine of ULVAC´s new generation ion implantation system for 300-mm wafers, which system is capable of flexible use in factory designs. The basic concept of the system and the key technologies that were indispensable to realizing the design concept-such as the beam scanner, in-line dose monitor and evacuation system-are described in other documents. In this paper, the basic design and the performance experimentally confirmed of the prototype of IW-680 are discussed
Keywords
ion implantation; semiconductor device manufacture; semiconductor doping; 300 mm; 300-mm wafers; IW-630; beam scanner; core ion implanter; design concept; evacuation system; in-line dose monitor; Acceleration; Contamination; Electrostatics; Magnetic separation; Mass production; Optical beams; Particle beam optics; Prototypes; Structural beams; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1999.812074
Filename
812074
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