Title :
A technique for the production of multiple, large, mass analysed ribbon ion beams
Author_Institution :
Superion Ltd., UK
Abstract :
An ion source for the production of very uniform multiple ribbon beams combined with a mass analysis technique giving mass analysis of beams of any size or number leads to a machine technology capable of producing extremely high current, but low current density, ion beams. Low energy mass analysed implants up to 100 mA, Flat Panel Display implants with extremely large multiple beams and multi-amp oxygen implants will be possible with this new technology
Keywords :
beam handling techniques; ion accelerators; ion implantation; ion optics; ion sources; particle beam diagnostics; Flat Panel Display implants; ion source; machine technology; mass analysis technique; multiple large mass analysed ribbon ion beams production; Electrodes; Implants; Ion beams; Ion sources; Magnetic analysis; Magnetic separation; Mass production; Particle beam optics; Particle separators; Ultraviolet sources;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1999.812086
