Enhanced low energy drift-mode beam currents in a high current ion implanter

Author

Angel, Gordon ; Bell, Edward ; Brown, Douglas ; Buff, James ; Collins, Mark ; Cummings, James ; Radovanov, Svetlana ; White, Nicholas R.

Author_Institution

Varian Ion Implant Syst., Gloucester, MA, USA

Volume

1

fYear

1999

fDate

1999

Firstpage

219

Abstract

The VIISta 80 high current ion implanter uses one or two stages of deceleration to produce the requisite high beam currents at low energies. For implantation processes that have a zero tolerance for energy contamination the single stage of deceleration located before the final bending magnet provides an enhanced drift mode of operation in which the end station sees ions issuing from a virtual source located at the mass slit. The development of the deceleration system and some preliminary results are discussed

Keywords

beam handling techniques; ion implantation; particle beam diagnostics; semiconductor device manufacture; semiconductor doping; VIISta 80 high current ion implanter; deceleration; energy contamination; enhanced low energy drift-mode beam currents; high beam currents; high current ion implanter; mass slit; virtual source; zero tolerance; Boron; Contamination; Electrostatics; Energy resolution; Implants; Magnetic analysis; Production; Semiconductor device manufacture; Space charge; Throughput;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology Proceedings, 1998 International Conference on

Conference_Location

Kyoto

Print_ISBN

0-7803-4538-X

Type

conf

DOI

10.1109/IIT.1999.812091

Filename

812091