DocumentCode :
3409078
Title :
Instabilities of charged particle beams in plasmas
Author :
Chen, Jiong
Author_Institution :
Semicond. Equipment Div., Eaton Corp., Beverly, MA, USA
Volume :
1
fYear :
1999
fDate :
1999
Firstpage :
255
Abstract :
Instabilities in ion beam implanters are the results of multiple processes caused by the motions of a large number of plasma particles. The study of beam plasma instabilities is critical to the optimization of transport systems for low energy beams. Due to instabilities, low energy beam currents are limited even if complete space charge compensation (i.e. d.c. space potential=0) is achieved. Minor instabilities deplete electrons from the beam causing it to blow up. Severe instabilities inhibit beams by forming virtual cathodes for electron beams or virtual anodes for ion beams. This paper reviews beam plasma instabilities and a dispersion relation for beam plasmas is developed based upon three fluid equations (beam ions, thermalized electrons and slow ions) and Poisson´s equation. From the dispersion relation, an instability threshold dependent on ion beam current density is derived. Criteria to postpone the occurrence of the instabilities are outlined
Keywords :
ion implantation; particle beams; plasma instability; space charge; Poisson´s equation; beam current; beam plasma instabilities; charged particle beams; dispersion relation; fluid equations; instability threshold; ion beam implanters; low energy beams; plasma particles; space charge compensation; virtual anodes; virtual cathodes; Anodes; Cathodes; Dispersion; Electron beams; Ion beams; Particle beams; Plasma density; Plasma transport processes; Poisson equations; Space charge;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
Type :
conf
DOI :
10.1109/IIT.1999.812100
Filename :
812100
Link To Document :
بازگشت