Title :
Chemically sensitive Field Effect Transistors of oxide-free silicon nanowires - towards detection of volatile biomarkers of cancer
Author :
Assad, Ossama ; Haick, Hossam
Author_Institution :
Russell Barrie Nanotechnol. Inst., Dept. of Chem. Eng., Technion - Israel Inst. of Technol., Haifa
fDate :
June 30 2008-July 2 2008
Abstract :
In this paper we show that oxide-coating of Si nanowires (NWs) limit the response of Si NW field effect transistors (FETs) to their environment, also if the NWs are coated with adsorptive molecular functionality. This behavior is in accord with prior works showing that Si/SiO2 interface trap and scatters carriers and compensate for the back gate voltage of FETs. Etching-away the SiO2 and terminating the surface of Si NWs by molecular functionality through stable Si-C bond lead for high-sensitive detection levels of various polar and a-polar vapor compounds at concentration levels down to few tens of ppb. Using an array of molecule-terminated, oxide-free Si NW FETs in an electronic nose configuration allow analysis of complex multi-component (bio) chemical media and good discrimination between simulated patterns of ldquohealthyrdquo and ldquocancerousrdquo breathe.
Keywords :
cancer; electronic noses; field effect transistors; nanowires; patient diagnosis; FET; Si; adsorptive molecular functionality; back gate voltage; cancer volatile biomarker detection; chemically sensitive field effect transistors; electronic nose configuration; oxide-free silicon nanowires; Biomarkers; Bonding; Cancer detection; Chemicals; Etching; FETs; Nanowires; Scattering; Silicon; Voltage;
Conference_Titel :
Industrial Electronics, 2008. ISIE 2008. IEEE International Symposium on
Conference_Location :
Cambridge
Print_ISBN :
978-1-4244-1665-3
Electronic_ISBN :
978-1-4244-1666-0
DOI :
10.1109/ISIE.2008.4676961