• DocumentCode
    3409247
  • Title

    Radiation emission from ion implanters when implanting hydrogen and deuterium

  • Author

    Saadatmand, Kourosh ; McIntyre, Edward ; Roberge, Steve ; Wan, Zhimin ; Wenzel, Kevin ; Rathmell, Robert ; Dykstra, Jerry

  • Author_Institution
    Semicond. Equip. Div., Eaton Corp., Beverly, MA, USA
  • Volume
    1
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    292
  • Abstract
    An increasing interest in proton and deuterium implants has been expressed among the semiconductor device fabricators. The possible production of neutrons and high energy gamma rays during such implants necessitated an extensive radiation study of implanters. A series of experiments to study neutron and gamma production with beams of H, D, B, P and As on common implanter materials such as C, Al, Si and the dopants themselves have been performed. Based on our experimental data, and the underlying physical reactions, we concluded that neutron generation is negligible in operation of B from BF3 feed materials and from P or As from hydride feed materials. Operation of the implanter with feed materials composed of enhanced amounts of deuterium at any energy will result in significant neutron generation. Proton beams below certain energies can be used safely, with common implanter materials as targets, while maintaining acceptable radiation levels. At higher energies the risk of activation and gamma ray production increases, depending on the material used for the target and beam line components
  • Keywords
    ion implantation; radiation monitoring; safety; semiconductor doping; Al; As; B; BF3; BF3 feed materials; C; D; H; P; Si; deuterium; deuterium implants; high energy gamma rays; hydride feed materials; hydrogen; ion implanters; neutrons; proton beams; proton implants; radiation emission; Deuterium; Feeds; Gamma rays; Hydrogen; Implants; Neutrons; Production; Protons; Semiconductor devices; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology Proceedings, 1998 International Conference on
  • Conference_Location
    Kyoto
  • Print_ISBN
    0-7803-4538-X
  • Type

    conf

  • DOI
    10.1109/IIT.1999.812110
  • Filename
    812110