DocumentCode :
3409247
Title :
Radiation emission from ion implanters when implanting hydrogen and deuterium
Author :
Saadatmand, Kourosh ; McIntyre, Edward ; Roberge, Steve ; Wan, Zhimin ; Wenzel, Kevin ; Rathmell, Robert ; Dykstra, Jerry
Author_Institution :
Semicond. Equip. Div., Eaton Corp., Beverly, MA, USA
Volume :
1
fYear :
1999
fDate :
1999
Firstpage :
292
Abstract :
An increasing interest in proton and deuterium implants has been expressed among the semiconductor device fabricators. The possible production of neutrons and high energy gamma rays during such implants necessitated an extensive radiation study of implanters. A series of experiments to study neutron and gamma production with beams of H, D, B, P and As on common implanter materials such as C, Al, Si and the dopants themselves have been performed. Based on our experimental data, and the underlying physical reactions, we concluded that neutron generation is negligible in operation of B from BF3 feed materials and from P or As from hydride feed materials. Operation of the implanter with feed materials composed of enhanced amounts of deuterium at any energy will result in significant neutron generation. Proton beams below certain energies can be used safely, with common implanter materials as targets, while maintaining acceptable radiation levels. At higher energies the risk of activation and gamma ray production increases, depending on the material used for the target and beam line components
Keywords :
ion implantation; radiation monitoring; safety; semiconductor doping; Al; As; B; BF3; BF3 feed materials; C; D; H; P; Si; deuterium; deuterium implants; high energy gamma rays; hydride feed materials; hydrogen; ion implanters; neutrons; proton beams; proton implants; radiation emission; Deuterium; Feeds; Gamma rays; Hydrogen; Implants; Neutrons; Production; Protons; Semiconductor devices; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
Type :
conf
DOI :
10.1109/IIT.1999.812110
Filename :
812110
Link To Document :
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