Title :
The excess energy of a low-energy ion beam extracted from a source plasma containing negative ions
Author :
Sakudo, N. ; Hayashi, K. ; Kawasaki, Akari ; Ikenaga, N. ; Sakaguchi, N. ; Fujimura, K. ; Moriike, T. ; Okada, M. ; Maesaka, T. ; Ito, H.
Author_Institution :
Kanazawa Inst. of Technol., Ishikawa, Japan
Abstract :
A very low-energy ion beam of an energy level less than 100 eV needs exact evaluation for the energy value. Its energy value is inaccurate unless the plasma potential is taken into account with its total energy. The plasma potential causes the excess energy of a very low-energy ion beam. In this paper, we study the influence of negative ions on the excess energy. In a simple plasma model where the plasma consists only of electrons and singly-charged ions of a single specie, the plasma potential is proportional to the electron temperature. However, the real plasma for industrial use often contains some negative ions which also change the plasma potential. Theoretical study shows that the existence of negative ions decreases the plasma potential and accordingly lowers the excess energy
Keywords :
ion beams; ion implantation; ion sources; negative ions; particle beam extraction; plasma production; excess energy; ion implantation; low-energy ion beam extraction; negative ions; plasma potential; simple plasma model; source plasma; Chemicals; Electrons; Ion beams; Ion sources; Plasma accelerators; Plasma applications; Plasma properties; Plasma sources; Plasma temperature; Potential energy;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1999.812124