Resonant magnetic field microsensors in standard CMOS technology

Author

Baglio, Salvatore ; Latorre, Laurent ; Nouet, Pascal

Author_Institution

Catania Univ., Italy

Volume

1

fYear

1999

fDate

1999

Firstpage

452

Abstract

In this paper micromachined sensors for the estimation of magnetic field are presented. These devices have been realized through a MEMS technology based on a standard CMOS process coupled with an IC compatible post-processing phase. Different mechanical structures have been realized and studied. In particular the resonant working mode of the system has been taken into account. Particular attention has been devoted to the characterization of the interfering input effects Suitable models have been defined to allow meaningful numerical simulation of the electro-mechanical device

Keywords

CMOS integrated circuits; digital simulation; identification; magnetic field measurement; micromachining; microsensors; IC compatible postprocessing; MEMS technology; electro-mechanical device; estimation of magnetic field; mechanical structures; micromachined sensors; numerical simulation; resonant magnetic field microsensors; resonant working mode; standard CMOS process; standard CMOS technology; CMOS integrated circuits; CMOS process; CMOS technology; Magnetic fields; Magnetic resonance; Magnetic sensors; Mechanical sensors; Micromechanical devices; Microsensors; Semiconductor device modeling;

fLanguage

English

Publisher

ieee

Conference_Titel

Instrumentation and Measurement Technology Conference, 1999. IMTC/99. Proceedings of the 16th IEEE

Conference_Location

Venice

ISSN

1091-5281

Print_ISBN

0-7803-5276-9

Type

conf

DOI

10.1109/IMTC.1999.776793

Filename

776793