Title :
Simulation of wafer scale diagnosis
Author :
Iychettira, A. ; Laforge, L.E.
Author_Institution :
Dept. of Electr. Eng., Nevada Univ., Reno, NV, USA
Abstract :
Summary form only given. DWI (Diagnosis of Wafer Scale Integrated Circuits), is a DOS C/sup ++/ program whose purpose is to assess the practicality of system-level diagnosis on a wafer scale. On the manufacturing line, diagnosis offers a replacement for probe test. For in-the-field operation, diagnosis holds promise for increasing the accuracy whereby faulty elements are identified, at reduced cost. With all of these applications, diagnosis eliminates or greatly reduces the need of external test equipment. The increasing prevalence of monolithic and multichip wafer scale modules may accelerate the search for alternatives to probe and scan. DWI can help the designer answer architectural questions such as: 1) What is the effect of the element failure rate and distribution of failures? 2) What is the best diagnosis algorithm?.
Keywords :
circuit analysis computing; failure analysis; fault diagnosis; integrated circuit reliability; wafer-scale integration; DOS C/sup ++/ program; DWI; diagnosis algorithm; failure distribution; failure rate; faulty element identification; manufacturing line; monolithic wafer scale modules; multichip wafer scale modules; system-level diagnosis; wafer scale diagnosis simulation; wafer scale integrated circuits; Acceleration; Circuit faults; Circuit simulation; Circuit testing; Costs; Displays; Fault diagnosis; Manufacturing; Probes; Test equipment;
Conference_Titel :
Integrated Reliability Workshop, 1995. Final Report., International
Conference_Location :
Lake Tahoe, CA, USA
Print_ISBN :
0-7803-2705-5
DOI :
10.1109/IRWS.1995.493600