DocumentCode
3414175
Title
The influence of bias conditions upon the intrinsic noise parameters of short gate length GaAs MESFETs
Author
Greaves, S.D. ; Unwin, R.T.
Author_Institution
Div. of Electron. & Commun., Huddersfield Univ., UK
fYear
1995
fDate
35004
Firstpage
94
Lastpage
97
Abstract
For complete characterisation of the noise performance of FET type structures, such as MESFETs and HEMTs, accurate values for the device´s intrinsic noise parameters are required. These parameters have been shown to be sensibly frequency independent below 30 GHz but are strongly bias dependent. The problem of accurate determination of the intrinsic noise parameters for GaAs devices is complicated by the carrier transport mechanisms that exist in such material. This is particularly true for sub-micron gate-length devices where channel field strengths are far in excess of the critical field required for velocity saturation of the carriers. As yet no analytic solution is available that can accurately predict the current dependency of the intrinsic noise parameters of such devices. Here results obtained from measured noise data are presented that show the evolution of these parameters with drain current for two practical devices
Keywords
III-V semiconductors; Schottky gate field effect transistors; equivalent circuits; gallium arsenide; microwave field effect transistors; semiconductor device models; semiconductor device noise; 30 GHz; GaAs; bias conditions; channel field strength; characterisation; drain current; intrinsic noise parameters; short gate length MESFETs; submicron gate length devices; Circuit noise; Collaboration; Current measurement; Data mining; Frequency; Gallium arsenide; Laboratories; MESFETs; Noise generators; Noise measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
High Performance Electron Devices for Microwave and Optoelectronic Applications, 1995. EDMO., IEEE 1995 Workshop on
Conference_Location
London
Print_ISBN
0-7803-2537-0
Type
conf
DOI
10.1109/EDMO.1995.493701
Filename
493701
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