• DocumentCode
    3415324
  • Title

    Performance investigation on the reconfigurable Si nanowire schottky barrier transistors

  • Author

    Juncheng Wang ; Gang Du ; Zhiyuan Lun ; Kangliang Wei ; Lang Zeng ; Xiaoyan Liu

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • fYear
    2012
  • fDate
    Oct. 29 2012-Nov. 1 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In this paper, the performance of the reconfigurable Si nanowire Schottky barrier transistors (RFETs) is investigated with simulation method. In contrast to conventional Schottky barrier MOSFETs (SB-MOSFETs) and silicon nanowire transistors (Si-NWTs) with metal/silicide as source/drain, the separate two gates in RFETs are located at the two Schottky junctions. Our simulation results show the variable electric characteristics and working principle of the RFETs working as p-/n-type. The RFETs exhibit higher on/off current ratio compared with other Schottky transistors.
  • Keywords
    Schottky barriers; elemental semiconductors; field effect transistors; nanowires; silicon; RFET; Schottky barrier transistors; Schottky junctions; Si; electric characteristics; metal/silicide; on/off current ratio; p-/n-type; reconfigurable Si nanowire; silicon nanowire transistors; source/drain; Electric variables; Junctions; Logic gates; Schottky barriers; Silicides; Silicon; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
  • Conference_Location
    Xi´an
  • Print_ISBN
    978-1-4673-2474-8
  • Type

    conf

  • DOI
    10.1109/ICSICT.2012.6467586
  • Filename
    6467586