• DocumentCode
    3415519
  • Title

    Rad-Hard 32 nm FinFET Based Inverters

  • Author

    Rathod, S.S. ; Saxena, A.K. ; Dasgupta, S.

  • Author_Institution
    Electron. & Comput. Eng. Dept., Indian Inst. of Technol., Roorkee, India
  • fYear
    2009
  • fDate
    18-20 Dec. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper reports a novel circuit level hardening technique that can decrease sensitivity to radiation induced single event upsets in 32 nm FinFET based circuits. Five different types of 32 nm FinFET based inverters are analyzed. Proposed design outperforms over the unhardened circuit when exposed to radiation. This is majorly due to the innovative design technique used to neutralize effect of single event upset without affecting normal operation. Effect of back gate voltage and back gate oxide thickness variation is reported. Results indicate that the proposed design has good hardness to single event upset but has little area and power overheads than the unhardened FinFET based design.
  • Keywords
    MOSFET circuits; invertors; radiation hardening (electronics); FinFET based circuits; back gate oxide thickness; back gate voltage; circuit level hardening; innovative design technique; inverters; single event upset; unhardened circuit; Circuits; Doping; Electrostatics; FinFETs; Inverters; Radiation hardening; Silicon; Single event upset; Space technology; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    India Conference (INDICON), 2009 Annual IEEE
  • Conference_Location
    Gujarat
  • Print_ISBN
    978-1-4244-4858-6
  • Electronic_ISBN
    978-1-4244-4859-3
  • Type

    conf

  • DOI
    10.1109/INDCON.2009.5409457
  • Filename
    5409457