• DocumentCode
    3416373
  • Title

    Recent advances and future directions in a-Si:H TFT/LCD technology

  • Author

    Batey, John

  • Author_Institution
    Xerox PARK, Palo Alto, CA, USA
  • fYear
    1995
  • fDate
    25-26 Sep 1995
  • Firstpage
    24
  • Abstract
    The dramatic growth of portable computing over the past few years has been the driving force behind research and development in the area of amorphous silicon thin film transistor array technology. The focus has been on improving yield, lowering manufacturing costs, and increasing aperture ratio to improve battery life. More recently, however, we have seen a renewed effort aimed at increasing the size and resolution of LCDs, with a view to replacing CRTs for some applications. These applications push the limit of a-Si:H TFT array technology and present some very different challenges. The author reviews the progress made in both these arenas and highlights some of the key areas of focus for future R&D
  • Keywords
    amorphous semiconductors; elemental semiconductors; liquid crystal displays; silicon; thin film transistors; Si:H; a-Si:H TFT/LCD technology; amorphous silicon thin film transistor array; aperture ratio; battery life; manufacturing costs; portable computing; yield; Amorphous silicon; Apertures; Batteries; Cathode ray tubes; Costs; Manufacturing; Portable computers; Research and development; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Active Matrix Liquid Crystal Displays, 1995. AMLCDs '95., Second International Workshop on
  • Conference_Location
    Bethlehem, PA
  • Print_ISBN
    0-7803-3056-0
  • Type

    conf

  • DOI
    10.1109/AMLCD.1995.540952
  • Filename
    540952