DocumentCode
3416373
Title
Recent advances and future directions in a-Si:H TFT/LCD technology
Author
Batey, John
Author_Institution
Xerox PARK, Palo Alto, CA, USA
fYear
1995
fDate
25-26 Sep 1995
Firstpage
24
Abstract
The dramatic growth of portable computing over the past few years has been the driving force behind research and development in the area of amorphous silicon thin film transistor array technology. The focus has been on improving yield, lowering manufacturing costs, and increasing aperture ratio to improve battery life. More recently, however, we have seen a renewed effort aimed at increasing the size and resolution of LCDs, with a view to replacing CRTs for some applications. These applications push the limit of a-Si:H TFT array technology and present some very different challenges. The author reviews the progress made in both these arenas and highlights some of the key areas of focus for future R&D
Keywords
amorphous semiconductors; elemental semiconductors; liquid crystal displays; silicon; thin film transistors; Si:H; a-Si:H TFT/LCD technology; amorphous silicon thin film transistor array; aperture ratio; battery life; manufacturing costs; portable computing; yield; Amorphous silicon; Apertures; Batteries; Cathode ray tubes; Costs; Manufacturing; Portable computers; Research and development; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Active Matrix Liquid Crystal Displays, 1995. AMLCDs '95., Second International Workshop on
Conference_Location
Bethlehem, PA
Print_ISBN
0-7803-3056-0
Type
conf
DOI
10.1109/AMLCD.1995.540952
Filename
540952
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