DocumentCode
3418197
Title
Effects of metal coverage on MOSFET matching
Author
Tuinhout, H. ; Pelgrom, M. ; Penning de Vries, R. ; Vertregt, M.
Author_Institution
Philips Res., Eindhoven, Netherlands
fYear
1996
fDate
8-11 Dec. 1996
Firstpage
735
Lastpage
738
Abstract
Using dedicated MOSFET matching test structures, this paper demonstrates that performance of analog as well as digital circuit blocks can degrade dramatically in multi level metal CMOS processes when transistors are covered with metal. An optimized back-end treatment improved the MOSFET matching significantly.
Keywords
CMOS integrated circuits; MOSFET; integrated circuit metallisation; integrated circuit testing; MOSFET matching; analog circuit blocks; dedicated matching test structures; digital circuit blocks; metal coverage; multilevel metal CMOS processes; optimized back-end treatment; performance degradation; CMOS process; Capacitors; Circuit testing; Converters; Degradation; Electronic components; MOSFET circuits; Matched filters; Silicon; Solids;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location
San Francisco, CA, USA
ISSN
0163-1918
Print_ISBN
0-7803-3393-4
Type
conf
DOI
10.1109/IEDM.1996.554085
Filename
554085
Link To Document