DocumentCode
3418420
Title
Progress toward host tool integration of in situ particle monitors
Author
Borden, Peter G. ; Burghard, Raymond
Author_Institution
High Yield Technol., Sunnyvale, CA, USA
fYear
1992
fDate
30 Sep-1 Oct 1992
Firstpage
16
Lastpage
17
Abstract
The authors point out that in situ particle monitoring has gained substantial acceptance as a manufacturing process control technique, with the capability of providing automated 100% inspection during process. This is significant for several reasons, including faster detection of out of control events and higher baseline count rates as a consequence of the ability to monitor continuously, the detection of process- and intertool-related particle sources as a consequence of the ability to monitor during process, and an increase in availability as a consequence of the ability to automate particle tests. To fully achieve these benefits, the in situ monitor must be integrated into the host tool, something that can be done by either the end user or the tool supplier. Progress toward host integration in VLSI process tools is discussed
Keywords
VLSI; integrated circuit manufacture; particle counting; process control; VLSI process tools; automated inspection; baseline count rates; host tool integration; in situ particle monitors; intertool-related particle sources; manufacturing process control technique; Automatic control; Automatic testing; Costs; Event detection; Implants; Manufacturing processes; Monitoring; Process control; Production; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1992. ASMC 92 Proceedings. IEEE/SEMI 1992
Conference_Location
Cambridge, MA
Print_ISBN
0-7803-0740-2
Type
conf
DOI
10.1109/ASMC.1992.253826
Filename
253826
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