Fabrication of surface micromachined polysilicon actuators using dry release process of HF gas-phase etching

Author

Jong Hyun Lee ; Hoi Hwan Chung ; Seung Youl Kang ; Jong Tae Baek ; Hyung Joun Yoo

Author_Institution

Semicond. Technol. Div., Electron. & Telecommun. Res. Inst., Taejon, South Korea

fYear

1996

fDate

8-11 Dec. 1996

Firstpage

761

Lastpage

764

Abstract

The HF GPE (gas-phase etching) process was newly developed for the dry-release of sacrificial oxide in polysilicon surface micromachining. Using anhydrous HF gas and CH/sub 3/OH vapor, we successfully fabricated vibrating micro-gyroscope structures with virtually no process-induced stiction. Compared with conventional wet-release, HF GPE process showed more than eight times longer detachment length, which enables highly sensitive sensors.

Keywords

electrostatic devices; elemental semiconductors; etching; gyroscopes; microactuators; micromachining; microsensors; semiconductor technology; silicon; CH/sub 3/OH vapor; HF; HF gas-phase etching; Si; anhydrous HF gas; cantilevers; detachment length; electrostatic actuator fabrication; highly sensitive sensors; methanol vapor; polysilicon surface micromachining; process-induced stiction; sacrificial oxide dry release; surface micromachined polysilicon actuators; vibrating micro-gyroscope structures; Actuators; Electrostatics; Fabrication; Hafnium; Methanol; Micromachining; Micromechanical devices; Microstructure; Plasma applications; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1996. IEDM '96., International

Conference_Location

San Francisco, CA, USA

ISSN

0163-1918

Print_ISBN

0-7803-3393-4

Type

conf

DOI

10.1109/IEDM.1996.554091

Filename

554091