• DocumentCode
    3420191
  • Title

    Three dimensional metal micromachining: A disruptive technology for millimeter-wave filters

  • Author

    Reid, J. Robert ; Oliver, J. Marcus ; Vanhille, Ken ; Sherrer, David

  • Author_Institution
    NUVOTRONICS, LLC, Radford, VA, USA
  • fYear
    2012
  • fDate
    16-18 Jan. 2012
  • Firstpage
    17
  • Lastpage
    20
  • Abstract
    The development of silicon based integrated circuits has reached a point where a large portion of an RF system can be integrated onto a single die. However, to create complete RF/millimeter-wave systems, it is necessary to integrate this silicon die with several high performance passive components. Specifically, silicon integrated circuits tend to have limited performance for the design of transmission lines, filters, and antennas. The Polystrata process is a three dimensional metal micromachining process that addresses these weaknesses by providing monolithic fabrication of high performance passives. When applied to filters and upper microwave and millimeter-wave frequencies, metal micromachining can provide filter performance comparable with that of waveguide technology but 10-100× smaller. In this presentation, we will provide details of the Polystrata process, and show the performance that can be achieved with filters fabricated using this technology.
  • Keywords
    micromachining; microwave filters; millimetre wave filters; passive filters; silicon; waveguide filters; Polystrata process; Si; disruptive technology; high performance passive component; microwave wave frequency; millimeter wave filter; millimeter wave frequency; monolithic fabrication; silicon die; three dimensional metal micromachining process; Band pass filters; Metals; Microwave filters; Patch antennas; Resonator filters; Silicon; Ceramics; coaxial resonators; delay; delay-lines; filters; power amplifiers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Silicon Monolithic Integrated Circuits in RF Systems (SiRF), 2012 IEEE 12th Topical Meeting on
  • Conference_Location
    Santa Clara, CA
  • Print_ISBN
    978-1-4577-1317-0
  • Type

    conf

  • DOI
    10.1109/SiRF.2012.6160165
  • Filename
    6160165