DocumentCode
3421815
Title
InN-based anion selective sensing devices
Author
Lu, Yen-Sheng ; Ho, Jian-Lin ; Yeh, J. Andrew ; Gwo, Shangjur
Author_Institution
Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2009
fDate
17-19 June 2009
Firstpage
1
Lastpage
4
Abstract
Ion selective electrodes (ISEs) and ion selective field effect transistors (ISFETs) based on indium nitride (InN) film were used for detecting anions in aqueous solutions. The positively charged surface states on InN surfaces selectively adsorbed anions, building Helmholtz voltages near the InN/solution interface was confirmed using open-circuit potentiometric and I-V measurements. The InN-based ISE obeyed the Nernst equation with the sensitivity of 45 and 49 mV/decade for chloride and hydroxyl ions, showing remarkable selectivity, response time, stability and repeatability. Ultrathin (~10 nm) InN ISFETs demonstrated ion sensing with a sensitivity of 5 ¿A per decade and a response time less than 10s. Molecular-beam epitaxy (MBE) system was used to conduct the epitaxial growth of InN film on Si (111) substrate, enabling the InN based chemical sensors to integrate with the wireless sensors on the same chip to transmit real-time sensing data.
Keywords
III-V semiconductors; chemical sensors; indium compounds; molecular beam epitaxial growth; semiconductor growth; InN; anion selective sensing devices; chemical sensors; epitaxial growth; ion selective electrodes; ion selective field effect transistors; molecular-beam epitaxy; wireless sensors; Chemical sensors; Current measurement; Delay; Electrodes; Equations; FETs; Indium; Molecular beam epitaxial growth; Stability; Voltage; ISE; ISFET; anion selective sensor; indium nitride;
fLanguage
English
Publisher
ieee
Conference_Titel
Networked Sensing Systems (INSS), 2009 Sixth International Conference on
Conference_Location
Pittsburgh, PA
Print_ISBN
978-1-4244-6313-8
Electronic_ISBN
978-1-4244-6314-5
Type
conf
DOI
10.1109/INSS.2009.5409932
Filename
5409932
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