• DocumentCode
    3422998
  • Title

    Thin film metallic glasses as new MEMS materials

  • Author

    Hata, Satoshi ; Sakurai, Junpei ; Shimokohbe, A.

  • Author_Institution
    Precision & Intelligence Lab., Tokyo Inst. of Technol., Japan
  • fYear
    2005
  • fDate
    30 Jan.-3 Feb. 2005
  • Firstpage
    479
  • Lastpage
    482
  • Abstract
    In order to apply the metallic glasses to MEMS, Pd-based, Zr-based and Cu-based thin film metallic glasses (TFMGs) are fabricated successfully using an RF magnetron sputtering system. The TFMGs exhibit high strength and high elastic limit at room temperature and low viscosity (under 1013 Pa.s) at supercooled liquid region (SCLR). These characteristics are desirable for utilization of TFMGs as three dimensional (3D) micro-elastic-mechanisms. 3D microstructures are realized by novel microforming methods at the SCLR. These methods can be divided into two categories, namely the ´deformation-heating method´ and the ´heating-deformation method´. Using those new microforming methods, 3D MEMS made of TFMG with new shapes and functions are demonstrated.
  • Keywords
    copper alloys; metallic glasses; metallic thin films; micromechanical devices; palladium alloys; sputtered coatings; zirconium alloys; 3D micro elastic mechanisms; 3D microstructures; Cu; MEMS materials; Pd; RF magnetron sputtering system; Zr; deformation-heating method; heating-deformation method; high elastic limit; high strength; low viscosity; microforming methods; supercooled liquid region; thin film metallic glasses; Amorphous magnetic materials; Glass; Inorganic materials; Magnetic materials; Magnetoelasticity; Micromechanical devices; Radio frequency; Sputtering; Temperature; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-8732-5
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2005.1453971
  • Filename
    1453971