DocumentCode :
3422998
Title :
Thin film metallic glasses as new MEMS materials
Author :
Hata, Satoshi ; Sakurai, Junpei ; Shimokohbe, A.
Author_Institution :
Precision & Intelligence Lab., Tokyo Inst. of Technol., Japan
fYear :
2005
fDate :
30 Jan.-3 Feb. 2005
Firstpage :
479
Lastpage :
482
Abstract :
In order to apply the metallic glasses to MEMS, Pd-based, Zr-based and Cu-based thin film metallic glasses (TFMGs) are fabricated successfully using an RF magnetron sputtering system. The TFMGs exhibit high strength and high elastic limit at room temperature and low viscosity (under 1013 Pa.s) at supercooled liquid region (SCLR). These characteristics are desirable for utilization of TFMGs as three dimensional (3D) micro-elastic-mechanisms. 3D microstructures are realized by novel microforming methods at the SCLR. These methods can be divided into two categories, namely the ´deformation-heating method´ and the ´heating-deformation method´. Using those new microforming methods, 3D MEMS made of TFMG with new shapes and functions are demonstrated.
Keywords :
copper alloys; metallic glasses; metallic thin films; micromechanical devices; palladium alloys; sputtered coatings; zirconium alloys; 3D micro elastic mechanisms; 3D microstructures; Cu; MEMS materials; Pd; RF magnetron sputtering system; Zr; deformation-heating method; heating-deformation method; high elastic limit; high strength; low viscosity; microforming methods; supercooled liquid region; thin film metallic glasses; Amorphous magnetic materials; Glass; Inorganic materials; Magnetic materials; Magnetoelasticity; Micromechanical devices; Radio frequency; Sputtering; Temperature; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-8732-5
Type :
conf
DOI :
10.1109/MEMSYS.2005.1453971
Filename :
1453971
Link To Document :
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