DocumentCode
3423404
Title
Wafer-level vacuum package with vertical feedthroughs
Author
Chae, Junseok ; Giachino, Joseph M. ; Najafi, Khalil
Author_Institution
Center for Wireless Integrated MicroSystems (WIMS), Michigan Univ., Ann Arbor, MI, USA
fYear
2005
fDate
30 Jan.-3 Feb. 2005
Firstpage
548
Lastpage
551
Abstract
This paper reports a MEMS vacuum package with vertical feedthroughs formed in a glass substrate all at the wafer level. This approach satisfies requirements for MEMS vacuum packages, including small size, vacuum/hermetic capability, sealed and low parasitic feedthroughs, wafer level processing, compatibility with most MEMS processes, and low cost. It also enables flip-chip solder attachment to a PC board. The package has an integrated micro-Pirani gauge on a glass substrate for in-situ monitoring, silicon cap, and vertical feedthroughs through the glass. The integrated Pirani gauge has 0.6mTorr resolution at 0.1Torr and 0.2Torr resolution at 100Torr. Using the Pirani gauge, we have achieved ∼11Torr base pressure inside the vacuum package without a getter. Another package sealed at ∼80Torr has maintained its pressure for more than 2 months.
Keywords
flip-chip devices; hermetic seals; micromechanical devices; semiconductor device packaging; 0.6 mtorr; 100 torr; MEMS vacuum package; PC board; flip chip solder attachment; glass substrate; hermetic capability; integrated micro Pirani gauge; silicon cap; vacuum capability; vertical feedthroughs; wafer level processing; wafer level vacuum package; Costs; Drilling; Dynamic range; Glass; Micromechanical devices; Monitoring; Packaging; Silicon; Wafer scale integration; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
ISSN
1084-6999
Print_ISBN
0-7803-8732-5
Type
conf
DOI
10.1109/MEMSYS.2005.1453988
Filename
1453988
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