DocumentCode :
342437
Title :
Characterization of 1/f noise vs. number of gate stripes in MOS transistors
Author :
Chen, Hsin-Shu ; Ito, Akira
Author_Institution :
Harris Semicond., Melbourne, FL, USA
Volume :
2
fYear :
1999
fDate :
36342
Firstpage :
310
Abstract :
This paper examines low-frequency 1/f noise (or Bicker noise) in metal oxide semiconductor field-effect transistors (MOSFETs) versus number of gate stripes and bias conditions. Simulations using SPICE/Spectre with Cadence models have displayed the dependence of 1/f noise on the number of gate stripes and the bias conditions. Experimental results from a test chip designed and fabricated in a 0.5 μm CMOS process show that 1/f noise is independent of the number of gate stripes in both saturation and linear regions for both P-channel and N-channel devices. The measured results have also shown that 1/f noise is independent of the bias conditions in the saturation region but dependent on the bias conditions in the linear region
Keywords :
1/f noise; MOSFET; SPICE; semiconductor device models; semiconductor device noise; 0.5 micron; 1/f noise; Bicker noise; MOS transistors; N-channel devices; P-channel devices; SPICE; Spectre; bias conditions; gate stripes; linear regions; saturation regions; CMOS process; FETs; Low-frequency noise; MOSFETs; Noise measurement; SPICE; Semiconductor device measurement; Semiconductor device modeling; Semiconductor device noise; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 1999. ISCAS '99. Proceedings of the 1999 IEEE International Symposium on
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-5471-0
Type :
conf
DOI :
10.1109/ISCAS.1999.780720
Filename :
780720
Link To Document :
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