DocumentCode :
3424463
Title :
The impact of the floating-body effect suppression on SOI integrated circuits
Author :
Terauchi, M. ; Nishiyama, A. ; Mizuno, T. ; Yoshimi, M. ; Watanabe, S.
Author_Institution :
ULSI Res. Center, Toshiba Corp., Kawasaki, Japan
fYear :
1996
fDate :
8-11 Dec. 1996
Firstpage :
855
Lastpage :
858
Abstract :
The bandgap engineering technique suppresses not only anomalies in the DC transfer characteristics of SOI CMOS circuits but also characteristics fluctuations of SOI MOSFETs. It is experimentally verified that the floating-body effects in 8 k SOI MOSFETs in 0.7 mm/sup 2/ wafer area cannot be controlled completely with a conventional fabrication technique. Thus it is concluded that the suppression of the floating body effects is essential to fabricate actual LSIs utilizing SOI devices.
Keywords :
CMOS integrated circuits; energy gap; integrated circuit technology; large scale integration; silicon-on-insulator; DC transfer characteristics; LSI; SOI CMOS circuit; SOI MOSFET; SOI device; SOI integrated circuit; bandgap engineering; fabrication; floating-body effect; fluctuations; Circuits; Fabrication; Fluctuations; Inverters; Ion implantation; MOSFETs; Photonic band gap; Propagation delay; Ring oscillators; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-3393-4
Type :
conf
DOI :
10.1109/IEDM.1996.554114
Filename :
554114
Link To Document :
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