Title :
Structural study of ZnS/ZnSe strained layer superlattice grown by molecular beam epitaxy
Author :
Kimura, Ryuhei ; Ono, Tokumitsu ; Kida, Mitsunori ; Inoue, Miyoshi ; Takahashi, Kiyoshi ; Matsuzawa, Takeo
Author_Institution :
Dept. of Electr. & Inf. Sci., Nishi-Tokyo Univ., Yamanashi, Japan
Abstract :
Rapid progress has been made in short wavelength (blue or ultra-violet) semiconductor lasers in recent years. Group II-VI compound semiconductors have been receiving particular attention because of their wide bandgap. Superlattices allow optical and electrical characteristics to be freely set due to the quantum effect, so they are often utilized in the active layer of high performance LD´s. ZnS is one of the wide bandgap materials among the II-VI compounds (3.6 eV at R.T.) and the ZnS/ZnSe strained layer superlattice (SLS) has a large band discontinuity so that effective light and carrier confinement are expected. This work fabricates ZnS/ZnSe SLSs on ZnSe buffer layer using GaAs(100) wafer grown by molecular beam epitaxy (MBE). A basic structural and optical study is performed on these films. The effect of strain on the bandgap is also investigated by calculating the tight binding model
Keywords :
II-VI semiconductors; carrier mobility; molecular beam epitaxial growth; semiconductor device models; semiconductor epitaxial layers; semiconductor growth; semiconductor lasers; semiconductor superlattices; tight-binding calculations; wide band gap semiconductors; zinc compounds; 3.6 eV; II-VI compound semiconductors; ZnS-ZnSe; active layer; band discontinuity; carrier confinement; electrical characteristics; molecular beam epitaxy; short wavelength semiconductor lasers; strained layer superlattice; tight binding model; wide bandgap; Electric variables; II-VI semiconductor materials; Molecular beam epitaxial growth; Optical buffering; Optical films; Optical superlattices; Photonic band gap; Semiconductor lasers; Semiconductor superlattices; Zinc compounds;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1995, Proceedings of 1995 Japan International, 18th IEEE/CPMT International
Conference_Location :
Omiya
Print_ISBN :
0-7803-3622-4
DOI :
10.1109/IEMT.1995.541023