DocumentCode :
3425515
Title :
Micro proximity electron source for nanoprocessing in atmosphere
Author :
Cho, Wonie ; Ono, Takahito ; Minh, Phan Ngoc ; Esashi, Masayoshi
Author_Institution :
Graduate Sch. of Eng., Tohoku Univ., Sendai, Japan
fYear :
2005
fDate :
30 Jan.-3 Feb. 2005
Firstpage :
875
Lastpage :
878
Abstract :
We have designed and fabricated a miniature proximity electron source, which can be used in atmosphere for future high density data storage or electron beam direct lithography. Carbon nanocoils (CNCs) grown on silicon are adopted as electron emitters because of their excellent field emission properties. Electrons are transmitted from a vacuum-sealed cavity to atmosphere through a thin film called as an electron window. As the membrane of the electron window, an ultrathin silicon film is chosen. The submicron diameter of the window will make narrow exuded electron distribution. We propose the concept and design of the device and report on the result of fabrication and measurements of the emission characteristics of CNCs.
Keywords :
electron field emission; electron sources; nanotechnology; silicon; thin films; carbon nanocoils; electron beam direct lithography; electron emitters; electron window; high density data storage; microproximity electron source; miniature proximity electron source; nanoprocessing; thin film; ultrathin silicon film; vacuum-sealed cavity; Atmosphere; Biomembranes; Carbon dioxide; Electron beams; Electron guns; Electron sources; Lithography; Memory; Silicon; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-8732-5
Type :
conf
DOI :
10.1109/MEMSYS.2005.1454069
Filename :
1454069
Link To Document :
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