DocumentCode :
3426649
Title :
One-parameter tuning PID control of chemical processes
Author :
Fujii, Kenzo ; Yamamoto, Toru
Author_Institution :
Idemitsu Process Center, Idemitsu Kosan Co., Ltd., Ichihara, Japan
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
319
Lastpage :
324
Abstract :
This paper presents a useful technology for the advanced stability control for the total plant. In particular, the unification of ´Control performance assessment´ and ´Con-troller design´ is discussed. The proposed scheme has a unique feature which allows PID parameters to be tuned by just one user-specified parameter. This methodology is based on a universal evaluation function, and the easy tuning system can be developed in which an entire plant can be highly stabilized, ultimately obtaining good control performance for a distillation process and a styrene furnace unit.
Keywords :
distillation; furnaces; stability; three-term control; PID control; advanced stability control; chemical process control; distillation process; one parameter tuning control; styrene furnace unit; universal evaluation function; Automatic control; Chemical processes; Control systems; Delay; Electrical equipment industry; Furnaces; Process control; Robust control; Stability; Three-term control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Control and Automation, 2009. ICCA 2009. IEEE International Conference on
Conference_Location :
Christchurch
Print_ISBN :
978-1-4244-4706-0
Electronic_ISBN :
978-1-4244-4707-7
Type :
conf
DOI :
10.1109/ICCA.2009.5410312
Filename :
5410312
Link To Document :
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