DocumentCode :
3428750
Title :
Measurements of mechanical properties of microfabricated thin films
Author :
Ogawa, H. ; Suzuki, K. ; Kaneko, S. ; Nakano, Y. ; Ishikawa, Y. ; Kitahara, T.
Author_Institution :
Mech. Eng. Lab., AIST, Ibaraki, Japan
fYear :
1997
fDate :
26-30 Jan 1997
Firstpage :
430
Lastpage :
435
Abstract :
Mechanical properties of titanium thin films of 0.5 μm thickness, microfabricated by magnetron sputtering, were measured by using a novel tensile machine. These thin films are difficult to handle because they are markedly fragile, so the thin film specimens were fabricated by using semiconductor manufacturing technology in silicon frames to protect them. The test section of these specimens was 300 μm in width and 1.4 mm in length. By gripping the thin film specimen with a new device using a micrometer, it could be mounted on the tensile machine easily. The stress-strain diagrams of thin films were measured continuously in the atmosphere at room temperature. Tensile tests were conducted on specimens of 1.0 to 1.4 mm gauge length in order to examine the effect of gauge length on the measurements of mechanical properties. Measurements of Young´s modulus, tensile strength and breaking elongation were independent of gauge length for our range of measurements. The experimental results indicated that the titanium thin films had a smaller breaking elongation although they had a larger tensile strength than bulk pure titanium
Keywords :
Young´s modulus; elastic moduli measurement; elongation; materials testing; mechanical strength; metallic thin films; sputtered coatings; strain measurement; stress measurement; stress-strain relations; tensile strength; tensile testing; titanium; 0.5 micron; 1 to 1.4 mm; 300 micron; Ti; Ti thin films; Young modulus; breaking elongation; gauge length; magnetron sputtering; mechanical properties measurement; microfabricated thin films; stress-strain diagrams; tensile machine; tensile strength; Atmospheric measurements; Length measurement; Magnetic semiconductors; Mechanical factors; Mechanical variables measurement; Semiconductor thin films; Sputtering; Testing; Titanium; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1997. MEMS '97, Proceedings, IEEE., Tenth Annual International Workshop on
Conference_Location :
Nagoya
ISSN :
1084-6999
Print_ISBN :
0-7803-3744-1
Type :
conf
DOI :
10.1109/MEMSYS.1997.581882
Filename :
581882
Link To Document :
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