Manufacturing process improvements using advanced control methodologies

Author

Alvi, Nadeem S.

Author_Institution

SEMATECH, Austin, TX, USA

fYear

1995

fDate

4-6 Dec 1995

Firstpage

276

Lastpage

282

Abstract

Implementation of advanced control on a manufacturing tool requires the integration of several modules like performance specification, sensors, system models, and a control framework. This paper discusses the implementation of real-time process control and run-to-run process control on furnace chemical vapor deposition (CVD), rapid thermal processing (RTP), and chemical mechanical polishing (CMP). Results demonstrating throughput enhancement and tighter process tolerances are presented

Keywords

MIMO systems; ULSI; chemical vapour deposition; circuit optimisation; integrated circuit manufacture; multivariable control systems; polishing; process control; rapid thermal processing; ULSI manufacturing; chemical mechanical polishing; control framework; control methodologies; furnace chemical vapor deposition; manufacturing process improvements; manufacturing tool; model based process controller; performance specification; process tolerances; rapid thermal processing; real-time process control; run-to-run process control; sensors; system models; throughput enhancement; Chemical processes; Chemical sensors; Chemical vapor deposition; Furnaces; Manufacturing processes; Mechanical sensors; Process control; Rapid thermal processing; Sensor systems; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronic Manufacturing Technology Symposium, 1995, Proceedings of 1995 Japan International, 18th IEEE/CPMT International

Conference_Location

Omiya

Print_ISBN

0-7803-3622-4

Type

conf

DOI

10.1109/IEMT.1995.541044

Filename

541044