Title :
Manufacturing process improvements using advanced control methodologies
Author_Institution :
SEMATECH, Austin, TX, USA
Abstract :
Implementation of advanced control on a manufacturing tool requires the integration of several modules like performance specification, sensors, system models, and a control framework. This paper discusses the implementation of real-time process control and run-to-run process control on furnace chemical vapor deposition (CVD), rapid thermal processing (RTP), and chemical mechanical polishing (CMP). Results demonstrating throughput enhancement and tighter process tolerances are presented
Keywords :
MIMO systems; ULSI; chemical vapour deposition; circuit optimisation; integrated circuit manufacture; multivariable control systems; polishing; process control; rapid thermal processing; ULSI manufacturing; chemical mechanical polishing; control framework; control methodologies; furnace chemical vapor deposition; manufacturing process improvements; manufacturing tool; model based process controller; performance specification; process tolerances; rapid thermal processing; real-time process control; run-to-run process control; sensors; system models; throughput enhancement; Chemical processes; Chemical sensors; Chemical vapor deposition; Furnaces; Manufacturing processes; Mechanical sensors; Process control; Rapid thermal processing; Sensor systems; Virtual manufacturing;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1995, Proceedings of 1995 Japan International, 18th IEEE/CPMT International
Conference_Location :
Omiya
Print_ISBN :
0-7803-3622-4
DOI :
10.1109/IEMT.1995.541044
