• DocumentCode
    3431109
  • Title

    Use of test structures for characterising a novel photosensitive organometallic material for MOS processes

  • Author

    Dicks, M.H. ; Broxton, G.M. ; Thomson, J. ; Lobban, J. ; Stevenson, J.T. ; Walton, A.J.

  • Author_Institution
    Sch. of Eng. & Electron., Edinburgh Univ., UK
  • fYear
    2003
  • fDate
    17-20 March 2003
  • Firstpage
    14
  • Lastpage
    18
  • Abstract
    A novel process is presented which produces platinum features using direct UV exposure of a photosensitive organometallic material. The deposited films are metallic and have a good adhesion to silicon dioxide. A test chip with MOS capacitors and sheet resistance structures fabricated using the new organometallic material has been characterised.
  • Keywords
    MOS capacitors; MOS integrated circuits; adhesion; integrated circuit testing; MOS capacitors; MOS processes; adhesion; direct UV exposure; photosensitive organometallic material; sheet resistance structures; test chip; test structures; Etching; Inorganic materials; Materials testing; Metallization; Microelectronics; Physics; Platinum; Resists; Sheet materials; Telephony;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 2003. International Conference on
  • Conference_Location
    Monterey, CA, USA
  • Print_ISBN
    0-7803-7653-6
  • Type

    conf

  • DOI
    10.1109/ICMTS.2003.1197362
  • Filename
    1197362
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3431109