DocumentCode
3431722
Title
Parameter identification for model-based advanced process control of diffusion furnaces
Author
Hui, K. ; Lu, C.S.
Author_Institution
Taiwan Semicond. Manuf. Co., Ltd., Hsin-Chu, Taiwan
fYear
2002
fDate
10-11 Dec. 2002
Firstpage
136
Lastpage
139
Abstract
The main practice of the current trend in Advanced Process Control (APC) concentrates on run-to-run controls. Even with the few exceptions on wafer-based applications, these practices mostly rely on statistical associations for changing the controlled variables in relation to some direct or indirect measurements of process parameters. This paper reports another approach to the current mainstream APC practice by adopting real-time control techniques. First step of this approach requires a thorough understanding of the underlying physics of the process dynamics. Utilizing fundamental equations governing temperature variations for diffusion furnaces, mathematical models are obtained in state-space formulation. Parameter estimation of these models is performed from online production data for individual tool-sets. Practical issues during this implementation process are discussed in detail. As an in-house development, it integrated understanding of the governing process dynamics and digital data processing techniques without enlisting support from equipment manufacturer or software vendors.
Keywords
furnaces; parameter estimation; process control; real-time systems; state-space methods; advanced process control; diffusion furnace; digital data processing technique; mathematical model; online production data; real time control technique; state space formulation; Data processing; Equations; Furnaces; Mathematical model; Parameter estimation; Physics; Process control; Production; Semiconductor device modeling; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Technology Workshop, 2002
Print_ISBN
0-7803-7604-8
Type
conf
DOI
10.1109/SMTW.2002.1197393
Filename
1197393
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