• DocumentCode
    3431862
  • Title

    Study of the thermal drift of the offset voltage of silicon pressure sensor

  • Author

    Boukabache, A. ; Blasquez, G. ; Pons, P. ; Dibi, Z.

  • Author_Institution
    Inst. d´´Electron., Constantine Univ., Algeria
  • Volume
    2
  • fYear
    1999
  • fDate
    5-8 Sep 1999
  • Firstpage
    1051
  • Abstract
    Pressure sensors produced using microelectronic techniques, in particular those based on the piezoresistive effect of silicon, present a high gauge factor. However, the electrical behaviour of the sensor is highly dependent on the temperature gradient. Thus, they have also some limitations such as the offset voltage and its thermal drift. In this study, we present a theoretical approach and experiments to analyse the electrical response of a pressure sensor fabricated using monocrystalline silicon. This analysis is focused on the thermal behaviour of the offset voltage and its origins. It allows us to differentiate between the two kinds of the piezoresistors included in the Wheatstone bridge and to link their thermal coefficients to that of the thermal drift of the offset voltage
  • Keywords
    bridge instruments; elemental semiconductors; piezoelectric transducers; piezoresistive devices; pressure sensors; silicon; Si; Wheatstone bridge; electrical behaviour; electrical response; offset voltage; piezoresistive effect; pressure sensor; thermal coefficient; thermal drift; Biomembranes; Bridge circuits; Microelectronics; Passive optical networks; Piezoresistive devices; Sensor phenomena and characterization; Silicon; Temperature sensors; Thermal sensors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics, Circuits and Systems, 1999. Proceedings of ICECS '99. The 6th IEEE International Conference on
  • Conference_Location
    Pafos
  • Print_ISBN
    0-7803-5682-9
  • Type

    conf

  • DOI
    10.1109/ICECS.1999.813414
  • Filename
    813414