Standard free determination of trace metals in semiconductor chemicals by ICP-MS

Author

Lin, Y.P. ; Liu, S.H. ; Lai, W.S. ; Chen, S.L.

Author_Institution

Taiwan Semicond. Manuf. Co., Ltd., Hsin-Chu, Taiwan

fYear

2002

fDate

10-11 Dec. 2002

Firstpage

172

Lastpage

175

Abstract

This paper interprets quadrupole ICP-MS with PFA nebulizer for the spike recovery test of Na (sodium), Al (aluminum) and Cu (copper) in HF (hydrofluoric acid), BOE (buffer oxide etchant), APM (ammonia peroxide mixture) and HPM (hydrogen chloride peroxide mixture) by the direct sample introduction and analysis without matrix elimination procedure. The spike recoveries of Na, Al and Cu were all located in the range of 85%-115% with a 0.4 ppb spiked solution in various chemicals under the hot plasma mode. When using the semi-quantitative equation in the determination of unknown elements by standard reference to Na, Al would have good consistency between its measured value and calculated value.

Keywords

aluminium; copper; mass spectroscopic chemical analysis; semiconductor device manufacture; sodium; Al; Cu; ICP; Na; ammonia peroxide mixture; buffer oxide etchant; hydrogen chloride peroxide mixture; matrix elimination; plasma mode; quadrupole inductively coupled plasma; semiconductor chemicals; semiquantitative equation; spike recovery test; trace metals standard free determination; Aluminum; Chemicals; Copper; Etching; Hafnium; Hydrogen; Plasma applications; Plasma chemistry; Plasma measurements; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Technology Workshop, 2002

Print_ISBN

0-7803-7604-8

Type

conf

DOI

10.1109/SMTW.2002.1197402

Filename

1197402