• DocumentCode
    3432075
  • Title

    Fabrication Process Development for As2S3 Planar Waveguides using Standard Semiconductor Processing

  • Author

    Choi, Duk-Yong ; Madden, Steve ; Rode, Andrei ; Wang, Rongping ; Luther-Davies, Barry

  • Author_Institution
    Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT
  • fYear
    2007
  • fDate
    24-27 June 2007
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    We have developed an effective fabrication process for As2S3 waveguides. A bottom anti-reflection coating provides a suitable layer to protect the As2S3 film from attack by the alkaline developer whilst CHF3 plasma enables the patterning of waveguides with vertical-profile and smooth sidewalls.
  • Keywords
    arsenic compounds; optical fabrication; optical planar waveguides; sputter etching; As2S3; alkaline; bottom anti-reflection coating; dry etching; fabrication process; patterning; planar waveguides; plasma chemistry; semiconductor processing; Etching; Optical device fabrication; Optical films; Optical waveguides; Plasma applications; Plasma chemistry; Plasma properties; Plasma waves; Protection; Semiconductor waveguides;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Internet, 2007 and the 2007 32nd Australian Conference on Optical Fibre Technology. COIN-ACOFT 2007. Joint International Conference on
  • Conference_Location
    Melbourne, VIC
  • Print_ISBN
    978-0-9775657-3-3
  • Electronic_ISBN
    978-0-9775657-3-3
  • Type

    conf

  • DOI
    10.1109/COINACOFT.2007.4519163
  • Filename
    4519163
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3432075