Title :
Fabrication Process Development for As2S3 Planar Waveguides using Standard Semiconductor Processing
Author :
Choi, Duk-Yong ; Madden, Steve ; Rode, Andrei ; Wang, Rongping ; Luther-Davies, Barry
Author_Institution :
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT
Abstract :
We have developed an effective fabrication process for As2S3 waveguides. A bottom anti-reflection coating provides a suitable layer to protect the As2S3 film from attack by the alkaline developer whilst CHF3 plasma enables the patterning of waveguides with vertical-profile and smooth sidewalls.
Keywords :
arsenic compounds; optical fabrication; optical planar waveguides; sputter etching; As2S3; alkaline; bottom anti-reflection coating; dry etching; fabrication process; patterning; planar waveguides; plasma chemistry; semiconductor processing; Etching; Optical device fabrication; Optical films; Optical waveguides; Plasma applications; Plasma chemistry; Plasma properties; Plasma waves; Protection; Semiconductor waveguides;
Conference_Titel :
Optical Internet, 2007 and the 2007 32nd Australian Conference on Optical Fibre Technology. COIN-ACOFT 2007. Joint International Conference on
Conference_Location :
Melbourne, VIC
Print_ISBN :
978-0-9775657-3-3
Electronic_ISBN :
978-0-9775657-3-3
DOI :
10.1109/COINACOFT.2007.4519163
