• DocumentCode
    3432125
  • Title

    A New Charge based Compact Model for Lateral Asymmetric MOSFET and its application to High Voltage MOSFET Modeling

  • Author

    Chauhan, Yogesh Singh ; Krummenacher, Francois ; Gillon, Renuad ; Bakeroo, Benoit ; Declercq, Michel ; Ionescu, Adrian Mihai

  • Author_Institution
    Inst. of Microelectron. & Microsyst., Ecole Polytechnique Fed. de Lausanne
  • fYear
    2007
  • fDate
    6-10 Jan. 2007
  • Firstpage
    177
  • Lastpage
    182
  • Abstract
    The lateral asymmetric MOSFET, which has longitudinal doping variation in the channel, is the building block of many categories of high voltage MOSFETs e.g. LDMOS, VDMOS. Here we report a new charge based analytical compact model for lateral asymmetric MOSFET (LAMOS). Numerical device simulations are used to validate the intrinsic MOS region of high voltage MOSFET for lateral doping gradient in the channel. The model shows good results in DC and most importantly in AC regime, especially the peaks in CGD, COS and CGG capacitances. The LAMOS model is also validated along with the drift model on the measured DC characteristics of high voltage LDMOS transistor
  • Keywords
    MOSFET; semiconductor device models; semiconductor doping; LAMOS model; charge based compact model; drift model; high voltage MOSFET modeling; intrinsic MOS region; lateral asymmetric MOSFET; lateral doping gradient; longitudinal doping variation; Ambient intelligence; Capacitance; Doping profiles; Laboratories; Leg; MOSFET circuits; Neodymium; Semiconductor device doping; Semiconductor process modeling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Design, 2007. Held jointly with 6th International Conference on Embedded Systems., 20th International Conference on
  • Conference_Location
    Bangalore
  • ISSN
    1063-9667
  • Print_ISBN
    0-7695-2762-0
  • Type

    conf

  • DOI
    10.1109/VLSID.2007.15
  • Filename
    4092042