DocumentCode :
3432125
Title :
A New Charge based Compact Model for Lateral Asymmetric MOSFET and its application to High Voltage MOSFET Modeling
Author :
Chauhan, Yogesh Singh ; Krummenacher, Francois ; Gillon, Renuad ; Bakeroo, Benoit ; Declercq, Michel ; Ionescu, Adrian Mihai
Author_Institution :
Inst. of Microelectron. & Microsyst., Ecole Polytechnique Fed. de Lausanne
fYear :
2007
fDate :
6-10 Jan. 2007
Firstpage :
177
Lastpage :
182
Abstract :
The lateral asymmetric MOSFET, which has longitudinal doping variation in the channel, is the building block of many categories of high voltage MOSFETs e.g. LDMOS, VDMOS. Here we report a new charge based analytical compact model for lateral asymmetric MOSFET (LAMOS). Numerical device simulations are used to validate the intrinsic MOS region of high voltage MOSFET for lateral doping gradient in the channel. The model shows good results in DC and most importantly in AC regime, especially the peaks in CGD, COS and CGG capacitances. The LAMOS model is also validated along with the drift model on the measured DC characteristics of high voltage LDMOS transistor
Keywords :
MOSFET; semiconductor device models; semiconductor doping; LAMOS model; charge based compact model; drift model; high voltage MOSFET modeling; intrinsic MOS region; lateral asymmetric MOSFET; lateral doping gradient; longitudinal doping variation; Ambient intelligence; Capacitance; Doping profiles; Laboratories; Leg; MOSFET circuits; Neodymium; Semiconductor device doping; Semiconductor process modeling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Design, 2007. Held jointly with 6th International Conference on Embedded Systems., 20th International Conference on
Conference_Location :
Bangalore
ISSN :
1063-9667
Print_ISBN :
0-7695-2762-0
Type :
conf
DOI :
10.1109/VLSID.2007.15
Filename :
4092042
Link To Document :
بازگشت