DocumentCode
3432300
Title
BSIM3 RF models for MOS transistors: a novel technique for substrate network extraction
Author
Rustagi, Subhash C. ; Liao, Huailin ; Shi, Jinglin ; Xiong, Yong Zhong
Author_Institution
Inst. of Microelectron., Singapore, Singapore
fYear
2003
fDate
17-20 March 2003
Firstpage
118
Lastpage
123
Abstract
This paper presents a novel technique for extraction of substrate network and other extrinsic elements of the RF model for the MOS transistors. RF measurements in the common-gate configuration of the MOS transistors are used for the extraction of the substrate network. The values of the extracted substrate network elements are found to consistently scale with number of fingers. The measured large signal behavior (Pin-Pout characteristics) compare very well with the one modeled by the extracted parameters.
Keywords
MOSFET; UHF field effect transistors; UHF measurement; semiconductor device measurement; semiconductor device models; BSIM3 RF models; MOS transistors; RF measurements; common-gate configuration; fingers; large signal behavior; substrate network; substrate network extraction; CMOS technology; Capacitance; Circuit testing; Equivalent circuits; Fingers; MOSFETs; Microelectronics; Radio frequency; Resistors; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 2003. International Conference on
Print_ISBN
0-7803-7653-6
Type
conf
DOI
10.1109/ICMTS.2003.1197427
Filename
1197427
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