DocumentCode
343260
Title
A singular function approach to chemical vapor deposition model reduction
Author
Adomaitis, Raymond A.
Author_Institution
Dept. of Chem. Eng., Maryland Univ., College Park, MD, USA
Volume
3
fYear
1999
fDate
1999
Firstpage
2062
Abstract
A computational technique for producing reduced-order models of distributed parameter systems is developed in the context of a tungsten chemical vapor deposition (CVD) simulation problem. The reduced order simulations are formulated in terms of a reduced-basis Galerkin projection of the CVD system thermal dynamics model, where the trial functions are defined globally over the spatial domain and the entire processing cycle, reducing the simulation problem to the solution of a relatively small number of nonlinear algebraic equations. The singular functions used for the reduced basis are computed from eigenfunction expansion solutions of linearized, approximate models to the original nonlinear system. The resulting singular functions are found to be nearly identical to those produced by the proper orthogonal decomposition of data produced by converged simulations of the nonlinear system
Keywords
Galerkin method; algebra; chemical vapour deposition; distributed parameter systems; eigenvalues and eigenfunctions; process control; reduced order systems; chemical vapor deposition model reduction; eigenfunction expansion; linearized approximate models; nonlinear algebraic equations; reduced order simulations; reduced-basis Galerkin projection; singular function approach; thermal dynamics model; Chemical vapor deposition; Computational modeling; Context modeling; Distributed computing; Distributed parameter systems; Nonlinear dynamical systems; Nonlinear equations; Nonlinear systems; Reduced order systems; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 1999. Proceedings of the 1999
Conference_Location
San Diego, CA
ISSN
0743-1619
Print_ISBN
0-7803-4990-3
Type
conf
DOI
10.1109/ACC.1999.786282
Filename
786282
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