DocumentCode :
3434158
Title :
Microelectronics roadmap: from ultimate CMOS to quantum information systems
Author :
Wang, Kang L.
Author_Institution :
Sch. of Eng., Hong Kong Univ. of Sci. & Technol., China
fYear :
2001
fDate :
2001
Firstpage :
1
Abstract :
Summary form only given. The ITRS roadmap shows that scaling efforts will continue to a few tens of nanometers. This paper discusses the ITRS roadmap, leading to the ultimate CMOS and extrapolating to nanoelectronics. The major challenges are the fundamental limit of CMOS scaling and the increased number of global interconnects. Along the path to ultimate CMOS, vertical MOSFET and related devices are discussed. As we approach the nanometer scale, quantum behaviour plays an important role. The question is how to continue Moore´s law in increasing functional throughput per unit cost. The paper gives examples for potential off-the-roadmap types of disruptive technologies as a base for discussion. Among these are quantum tunneling devices to increase functional throughput per device. We may also look at alternate architectures such as cellular automata, in which only nearest neighbor interconnects are needed and this type of architecture is most suitable for self-assembly of nanostructures. The self-assembly technique has potential for low cost nanostructure fabrication. Controlled placement of self-organized structures is discussed. In this scheme, semiconductor quantum dots were grown on Si. The dot size, shape and density can be controlled by growth temperature, deposited coverage and doping. Cooperative, well-organized Ge quantum dots were achieved and they offered potential applications of dot arrays for potential cellular systems. Eventually, entirely new massive parallel quantum computation systems may evolve. A possible semiconductor implementation based on SiGe nanostructures is discussed
Keywords :
CMOS integrated circuits; MOSFET; cellular automata; integrated circuit interconnections; integrated circuit manufacture; integrated circuit technology; nanostructured materials; nanotechnology; quantum interference devices; self-assembly; semiconductor quantum dots; technological forecasting; tunnelling; CMOS; CMOS scaling limit; Ge; Ge quantum dots; ITRS roadmap; Moore´s law; Si; Si semiconductor quantum dots; SiGe; SiGe nanostructures; cellular automata; cellular systems; deposited coverage; doping; dot arrays; dot density; dot shape; dot size; extrapolation; functional throughput per device; functional throughput per unit cost; global interconnects; growth temperature; massive parallel quantum computation systems; microelectronics roadmap; nanoelectronics; nanometer scale; nanostructure fabrication cost; nanostructures; nearest neighbor interconnects; off-the-roadmap disruptive technologies; quantum behaviour; quantum information systems; quantum tunneling devices; scaling efforts; self-assembly; self-assembly technique; self-organized structure placement; semiconductor implementation; vertical MOSFET; MOSFET circuits; Microelectronics; Moore´s Law; Nanoelectronics; Quantum computing; Quantum dots; Self-assembly; Semiconductor nanostructures; Shape control; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2001. Proceedings. 2001 IEEE Hong Kong
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-6714-6
Type :
conf
DOI :
10.1109/HKEDM.2001.946904
Filename :
946904
Link To Document :
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